In the previous post I noted major advances in quantum mechanical calculations and noted that computer codes have become widely available. I also noted that naive application of these codes can lead to physically incorrect conclusions. Another reference along this direction, this time focussed on magnetic properties, was published as a Physics Trend [Physics, 3, 53(2010)] in late June. Take a look.
Modified graphene
Graphene has been touted as the new wonder material for electronics. As we have observed earlier, the excitement is due to the extraordinarily high carrier mobilities, among other interesting properties [1]. Unfortunately, graphene has no band gap, so it must be chemically or physically modified to become a useful semiconductor.
Chemical doping is developing apace, with electron donors (like alkali metals) [3] and hole donors (like bismuth and gold) [2] now experimentally established. Equally interesting is hydrogen “doping” (see references in [1]), realized by reacting graphene with hydrogen. This reaction has generally been carried out globally, but it occurs to me that one might use beam technology to drive localized reactions: proton beam, atomic hydrogen beam, or e-beam induction à la Zeiss MeRiT. All these procedures result in simultaneously splitting the valence and conduction bands and moving the fermi level.
Very recently, Chen’s group at Purdue reports a solid-state reaction under 30 kV e-beam bombardment of graphene on a substrate [4]. This reaction likewise modifies the band structure. (The authors claim that the dose, ~1800 μC / cm^2, is “typical” SEM exposure.)
Physically restructuring graphene also results in changes to its electrical properties, due to edge states (akin to surface states in 3-dimensional materials). Extremely high e-beam doses (~30 C / cm^2 at 200 kV) result in material removal from the beam impact point. Drndić’s group reports [5] creating holes and lines in suspended graphene by this method. The review by Krasheninnikov and Nordlund [6] is a highly valuable resource in regard to such physical restructuring of materials. The shorter review [7], also by Krasheninnikov, focuses on carbon materials.
References:
[1] Berashevich, Chakraborty, “Graphene and graphane: New stars of nanoscale electronics”, arXiv:1003.0044.
[2] Gierz, et al., “Atomic Hole Doping of Graphene”, arXiv:0808.0621.
[3] Ohta, et al., “Controlling the Electronic Structure of Bilayer Graphene”, Science 313, 951 (2006).
[4] Childres, et al., “Effect of electron-beam irradiation on graphene field effect devices”, arXiv:1008.4561.
[5] Fischbein, Drndić, “Electron Beam Nanosculpting of Suspended Graphene Sheets”, arXiv:0808.2974.
[6] Krasheninnikov, Nordlund, “Ion and electron irradiation-induced effects in nanostructured materials”, J Appl Phys 107, 071301 (2010).
[7] Krasheninnikov, Banhart, “Engineering of nanostructured carbon materials with electron or ion beams”, Nature Materials, 6 (2007) 723-33.
Diverse ramifications of geometric phase
Geometric phase (or Pancharatnam-Berry phase) has many surprising effects. What is this variously named “phase”? To quote Wikipedia, “The Berry phase occurs when [two] parameters are changed simultaneously but very slowly (adiabatically), and eventually brought back to the initial configuration.” [1] A light-hearted and easily understood introduction can be found in section 1 of ref. [2]. In what follows, I give a few examples of geometric phase effects that are relevant to nano-technology. (A lengthy review of the Berry phase in electronics can be found in [3].)
- A group at TU Denmark have shown in [4] that the Berry phase effects associated with electrical current flowing through a conductive molecular bridge may induce mechanical vibration sufficiently strong to rupture the bridge. This phenomenon is unrelated to electromigration, Joule heating, or other well-known effects. It is purely a result of the quantum mechanical phase of the electric waves.
- In an interesting experiment [5], Kohmura-san and colleagues at RIKEN demonstrate millimeter distance translation of X-rays by bent silicon crystals. The crystal was bent only 80 nm or so to achieve a beam displacement of 1.5 mm. See [6] for a brief summary.
- The Hasman group at the Technion have constructed optical structures showing technologically applicable geometric phase behavior. In [7] and [8] they display nano-lithographically defined gratings and apertures which can act as optical switches, among other things.
Try the little demonstration in [2]. It will serve as a reminder to keep your eyes open to the geometric phase.
References:
[1] Wikipedia article, http://en.wikipedia.org/wiki/Berry’s_phase
[2] Robert W. Batterman, “Falling Cats, Parallel Parking, and Polarized Light”, http://philsci-archive.pitt.edu/archive/00000794/00/falling-cats.pdf
[3] Di Xiao, et al., “Berry Phase Effects on Electronic Properties”, Rev. Mod. Phys. 82 (2010) 1959-2007, http://rmp.aps.org/abstract/RMP/v82/i3/p1959_1
[4] Jing-Tao Lu, et al., “Blowing the Fuse: Berry’s Phase and Runaway Vibrations in Molecular Conductors”, Nano Letters 10 (2010) 1657-63, http://pubs.acs.org/doi/abs/10.1021/nl904233u
[5] Yoshiki Kohmura, et al., “Berry-Phase Translation of X Rays by a Deformed Crystal”, Phys. Rev. Lett. 104 (2010) 244801, http://prl.aps.org/abstract/PRL/v104/i24/e244801
[6] Adams, “Geometric phase kicks x rays down a new path”, http://physics.aps.org/articles/v3/50
[7] Erez Hasman, et al., “Polarization beam-splitters and optical switches based on space-variant computer-generated subwavelength quasi-periodic structures”, Optics Communications 209 (2002) 45-54, DOI: 10.1016/S0030-4018(02)01598-5, http://www.sciencedirect.com/science/article/B6TVF-4645DRF-1/2/6f0b7ca5cf17b751e48bbf1cf1e77d03
[8] Yuri Gorodetski, “Observation of Optical Spin Symmetry Breaking in Nanoapertures”, Nano Lett., Vol. 9, No. 8, 2009, http://pubs.acs.org/doi/abs/10.1021/nl901437d
Efficiency of electron beam (and EUV) exposure in CAR
Toriumi-san is on a roll. He has for two years now reported on theoretical calculations designed to discover the dominant reaction channels opened up during exposure of resist by high energy electrons. [1, 2]
In simplest terms, electron beam exposure is highly inefficient compared with optical exposure of resists. An optical resist is designed so that a photon has a high probability of exciting a resist component molecule into a reactive state, from which the desired reaction (chain) occurs. In scattering theory terminology, only one “channel” is opened by the incoming photon.
Such simplicity is not possible in EUV or in electron exposure. These energy sources open a huge number of channels, with little regard to the precise chemical make-up of the resist material. Specifically, EUV and electron beam dump most of their reactive energy into the polymer matrix rather than into photo-active additives. The process creates all manner of excited states.
To get an idea of how difficult it is to sort out the resulting mess, it suffices to go to http://scitation.aip.org/ and enter the search string ((acid generation)\<and\>(electron beam)). Among other things, it was found long ago that electron beam exposure leads to cross-linking of the polymer matrix. This runs contrary to the chain scission that one wants in a positive tone resist. Interestingly, electron beam exposure also leads to chain scission. To some extent, the polymer can be designed for greater resistance to one or the other reaction, but this may not be compatible with chemical amplification.
In addition, only a small fraction of the electron energy is transferred to the resist on first pass. Many things have been tried, in order to increase the cross-section of the initial energy transfer. Among the simpler, adding halogens to the resist introduces another whole set of competing reactions, usually poisoning the desired reactions. Adding heavy metals results in X-ray generation, with attendant blurring.
So what to do?
Perhaps we have to leave behind chemical amplification for the next generations of lithography. [3-6]
References:
[1] Theoretical analysis of energy degradation of electrons in the resists
Minoru Toriumi
Proc. SPIE 7273, 72732X (2009), DOI:10.1117/12.813940
http://spiedl.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=PSISDG00727300000172732X000001&idtype=cvips&gifs=yes&ref=no
[2] Theoretical analysis of energy dissipation of electron in the resists II
Minoru Toriumi
Proc. SPIE 7639, 76392N (2010), DOI:10.1117/12.846503
http://spiedl.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=PSISDG00763900000176392N000001&idtype=cvips&gifs=yes&ref=no
[3] Negative-type extreme ultraviolet Resist Materials based on Water-Wheel-like Cyclic Oligomer (Noria)
Hiroyuki Seki, Yuki Kato, Hiroto Kudo, Hiroaki Oizumi, Toshiro Itani and Tadatomi Nishikubo
Jpn. J. Appl. Phys. 49 (2010) 06GF06, DOI: 10.1143/JJAP.49.06GF06
http://jjap.ipap.jp/link?JJAP/49/06GF06/
[4] Development of New Positive-Tone Molecular Resists Based on Fullerene Derivatives for Extreme Ultraviolet Lithography
Hiroaki Oizumi, Katsutomo Tanaka, Kiminori Kawakami and Toshiro Itani
Jpn. J. Appl. Phys. 49 (2010) 06GF04, DOI: 10.1143/JJAP.49.06GF04
http://jjap.ipap.jp/link?JJAP/49/06GF04/
[5] Alternatives to chemical amplification for 193nm lithography
Burak Baylav, Meng Zhao, Ran Yin, Peng Xie, Chris Scholz, Bruce Smith, Thomas Smith, and Paul Zimmerman,
Proc. SPIE 7639, 763915 (2010), DOI:10.1117/12.846924
http://spiedl.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=PSISDG007639000001763915000001&idtype=cvips&gifs=Yes&ref=no
[6] Characteristics of main chain decomposable star shaped polymer on EUV lithography
Taku Hirayama, Jun Iwashita, Sachiko Yoshizawa, Kenri Konno, and Takeshi Iwai
Proc. SPIE 7639, 76390Q (2010), DOI:10.1117/12.848439
http://spiedl.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=PSISDG00763900000176390Q000001&idtype=cvips&gifs=Yes&&ref=no
Anodic Aluminum Oxide
Anodic aluminum oxide (AAO) has long been known to display self-organized structure. Here is a nice SEM image. Since alumina is a durable material, AAO can be used as masks and molds for patterning materials. For example, polycyanurate nanorods were recently polymerised in AAO molds for sensing applications.
While self-organization yields largely periodic structures, long-range order must be induced by other means. This turns out to be quite simple: one embosses the aluminum starting layer before starting the anodization. See this article. Click through to the downloadable Supplementary info for a process pictorial.
The same Berkeley group now reports a variant of the technique to yield dual-diameter pores. They used these to grow germanium arrays which absorb 99% of all incoming radiation in the wavelength range of 300 nm – 900 nm. This is almost as absorptive as the SWNT carpet reported some time ago, (SEM image) but a good deal more useful for photonics.
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