Publications

Patents

“Multi-function module for an electron beam column”, US Patent 7,800,075 B2, 21 Sep 2010
“Electron anti-fogging baffle used as a detector”, US Patent 7,514,682 B2, 07 Apr 2009
“Critical dimension effects correction in a raster pattern generator”, US Patent 7,498,591 B2, 03 Mar 2009
“Writing a circuit design pattern with shaped particle beam flashes”, US Patent 7,476,880 B2, 13 Jan 2009
“Placement effects correction in a raster pattern generator”, US Patent 7,476,879 B2, 13 Jan 2009
“Electron beam column for writing shaped electron beams”, US Patent 7,427,765 B2, 23 Sep 2008
“Beam exposure writing strategy system and method”, US Patent 7,244,953 B2, 17 Jul 2007
“Electrostatic particle beam deflector”, US Patent 7,209,055 B1, 24 Apr 2007
“Method and apparatus for fast signal convolution using separated-spline kernel”, US Patent 6,912,323 B2, 28 Jun 2005
“Border modification for proximity effect correction in lithography”, US Patent 6,436,607 B1, 20 Aug 2002

“Raster shaped beam pattern generation for 70 nm photomask production”, Proc SPIE 4889 (2002) 168-76
“High throughput electron-beam lithography with a raster-scanned, variably shaped beam”, JVST B 19(6) (2001) 2455-8
“Contrast limitations in electron-beam lithography”, JVST B 17(6) (1999) 2945-7
“Fabrication of submicron apertures in thin membranes of silicon nitride”, JVST B 11(2) (1993) 259-62
“Phase-shift mask technology: requirements for e-beam mask lithography”, Proc SPIE 1464 (1991) 314-26
“Proximity effect correction at 10 keV using GHOST and sizing for 0.4 µm mask lithography”, JSVT B 8(6) (1990) 1775-9
“Phase-slips in the flow of superfluid ⁴He through a submicron orifice”, Physica B 165-166 pt. 1 (1990) 753-4